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Accueil > Recherche > Plasmas Froids > Publications > 2008

2008

Diagnostic Studies of Molecular Plasmas Using Mid-Infrared Semiconductor Lasers
J. Röpcke, S. Welzel, N. Lang, F. Hempel, L .Gatilova, O. Guaitella, A. Rousseau and P. B. Davies
Appl. Phys. B 92, 335–341 (2008)

Influence of water vapour on plasma/photocatalytic oxidation efficiency of acetylene
F. Thevenet, O. Guaitella, E. Puzenat, C. Guillard, A. Rousseau
Applied Catalysis B Environmental, 84 (2008) 813

C2H2 oxidation by plasma/TiO2 combination : Influence of the porosity, and photocatalytic mechanisms under plasma exposure
O. Guaitella, F. Thevenet, E. Puzenat, C. Guillard, A. Rousseau
Applied Catalysis B Environmental, 80 (2008) 296

Patterns of Plasma Filaments Propagating on a Dielectric Surface
S. Celestin, K. Allegraud, G. Canes-Boussard, N. Leick, O. Guaitella, A. Rousseau
IEEE Trans. Plasma Sci., 36 (2008) 1326

Influence of the charges deposition on the spatio-temporal self-organization of streamers in a DBD
S Celestin, G Canes-Boussard, O Guaitella, A Bourdon, A Rousseau
J. Phys. D : Appl. Phys. 41 (2008) 205214

Comparison between fluid simulations and experiments in inductively coupled argon/chlorine plasmas
C.S. Corr, E. Despiau-Pujo, P. Chabert, W.G. Graham, F.G. Marro, D.B. Graves
J. Phys. D. : Appl. Phys. 41 (2008) 185202

Molecular dynamics simulations of GaAs sputtering under low energy argon ion bombardment
E. Despiau-Pujo, P. Chabert, D.B. Graves
J. Vac. Sci. Technol. A 26 (2008) 274

Sheath and presheath in ion-ion plasmas via particle-in-cell simulation
A. Meige, G. Leray, J.L. Raimbault, P. Chabert
Appl. Phys. Lett. 92 (2008) 061501

Plasma ionization in low-pressure radio-frequency discharges - Part II : Particle-in-cell simulation
A. Meige, D. O’Connell, T. Gans, R.W. Boswell
IEEE Trans. Plasma Sci., 36 (2008) 1384

Neutral depletion versus repletion due to ionization
A. Fruchtman, G. Makrinich, J.L. Raimbault, L. Liard, J.M. Rax, P. Chabert
Phys. Plasmas 15, (2008) 057102

Sidewall passivation assisted by a silicon coverplate during Cl2–H2 and HBr inductively coupled plasma etching of InP for photonic devices
S. Bouchoule, G. Patriarche, S. Guilet, L. Gatilova, L. Largeau, P. Chabert
J. Vac. Sci. Technol. B 26 (2008) 666

Similarity law for rf breakdown
V. Lisovskiy, J.P. Booth, K. Landry, D. Douai, V. Cassagne, V. Yegorenkov
EPL, 82 (2008) 15001

Modes of low-pressure dual-frequency (27/2 MHz) discharges in hydrogen
V Lisovskiy, J-P Booth, K Landry, D Douai, V Cassagne, V Yegorenkov
Plasma Sources Sci. Technol. 17 (2008) 025002

Applying RF current harmonics for end-point detection during etching multi-layered substrates and cleaning discharge chambers with NF3 discharge
V Lisovskiy, J-P Booth, K Landry, D Douai, V Cassagne, V Yegorenkov
Vacuum 82 (2008) 321–327

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Directeur de la publication : Pascal Chabert (Directeur)